The Colloidal Domain : Where Physics, Chemistry, Biology, and Technology Meet /
Sábháilte in:
| Príomhchruthaitheoir: | |
|---|---|
| Rannpháirtithe: | |
| Formáid: | LEABHAR |
| Teanga: | Béarla |
| Foilsithe / Cruthaithe: |
Nueva York, EUA :
Wiley-VCH,
1999, c1999
|
| Eagrán: | 2a edición |
| Sraith: | (Advances in Interfacial Engineering Series)
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| Ábhair: | |
| Clibeanna: |
Níl clibeanna ann, Bí ar an gcéad duine le clib a chur leis an taifead seo!
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MARC
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| 001 | 000196286 | ||
| 005 | 20250521000000.0 | ||
| 009 | 20260310102820.942 | ||
| 020 | |a 0-471-24247-0 | ||
| 037 | |a Acervo ITESO - Biblioteca | ||
| 041 | |a ING | ||
| 082 | |a 541. 345 |b EVA | ||
| 100 | |a Evans, D. Fennell |e (autor) | ||
| 245 | 1 | 4 | |a The Colloidal Domain : |b Where Physics, Chemistry, Biology, and Technology Meet / |c D.F. Evans, H. Wennerström. |
| 250 | |a 2a edición | ||
| 264 | 4 | |a Nueva York, EUA : |b Wiley-VCH, |c 1999, c1999 | |
| 300 | |a XL, 632 p. | ||
| 336 | |a texto |b txt |2 rdacontenido | ||
| 337 | |a sin mediación |b n |2 rdamedio | ||
| 338 | |a volumen |b nc |2 rdasoporte | ||
| 440 | 1 | |a (Advances in Interfacial Engineering Series) | |
| 649 | |a XX | ||
| 650 | |a Coloides - |x Tema Principal | ||
| 650 | |a Disolvente | ||
| 650 | |a Soluciones (Química) | ||
| 650 | |a Fenómenos Superficiales - |x Tema Principal | ||
| 650 | |a Fisicoquímica | ||
| 700 | |a Wennerström, Hakan |e (autor) | ||
| 910 | |a Fondo General | ||
| 920 | |a Impresos - Libros | ||
| 930 | |a Colección General | ||
| 905 | |a 101 | ||
| 901 | |a 0500142193 |b IT1 |c ACC |u 20250521 | ||
| 902 | |a https://opac.biblio.iteso.mx/vufind/Record/000196286 | ||