Saint, C., & Saint, J. IC Mask Design: Essential Layout Techniques. McGraw-Hill.
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Chicago-čujuhus (17. p.)
Saint, Christopher, juo Judy Saint. IC Mask Design: Essential Layout Techniques. Nueva York, EUA: McGraw-Hill.
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MLA-čujuhus (9. p.)
Saint, Christopher, juo Judy Saint. IC Mask Design: Essential Layout Techniques. McGraw-Hill.
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